Estimating Step Heights from Top-Down SEM Images
نویسندگان
چکیده
منابع مشابه
Estimating cross-section semiconductor structure by comparing top-down SEM images
Scanning electron microscope (SEM) images for semiconductor line-width measurements are generally acquired in a topdown configuration. As semiconductor dimensions continue to shrink, it has become increasingly important to characterize the cross-section, or sidewall, profiles. Cross-section imaging, however, requires the physical cleaving of the device, which is destructive and time-consuming. ...
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ژورنال
عنوان ژورنال: Microscopy and Microanalysis
سال: 2019
ISSN: 1431-9276,1435-8115
DOI: 10.1017/s143192761900062x